Allschwil, Switzerland

Cosimo Dolente

This inventor holds 32 USPTO granted patents and 16 published patent applications, plus 2 CIPO patents and 30 EPO patents, primarily in Pharmaceutical Chemistry. Top assignees: Hoffmann-La Roche Inc., C4 Therapeutics, Inc.. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Cosimo Dolente. Retrieved from https://idiyas.com/inventor/cosimo-dolente

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 56.3

 

 

Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Basel, CH (2019 - 2020)
  • Allschwil, CH (2013 - 2023)

Company Filing History:


Years Active: 2013-2026

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Areas of Expertise:
Indazole Derivatives
BRAF Degraders
EGFR Inhibitors
BACE1 Inhibitors
Quinazolinone Derivatives
Spiro-Oxazolones
Pyridyl-Triazabicycles
Cyclohexyl Compounds
Therapeutics
Heteroaryl Compounds
Thiadiazines
Antagonists
32 patents (USPTO):Explore Patents

Title: Cosimo Dolente: Pioneering Inventor from Allschwil

Introduction: Cosimo Dolente is a renowned inventor hailing from Allschwil, Switzerland, known for his groundbreaking contributions to various fields of innovation.

Latest Patents: Cosimo Dolente holds several patents in the areas of renewable energy technologies, sustainable materials, and advanced medical devices, showcasing his diverse range of expertise.

Career Highlights: With over two decades of experience in the innovation industry, Cosimo Dolente has successfully brought numerous inventions from concept to market, revolutionizing the way we approach challenges in today's world.

Collaborations: Throughout his career, Cosimo Dolente has collaborated with leading research institutions, universities, and multinational companies to further develop and commercialize his inventions, solidifying his reputation as a visionary inventor.

Conclusion: Cosimo Dolente's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors, leaving a lasting impact on the world of technology and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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