Delran, NJ, United States of America

Colin F Cameron, Jr


Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: **Innovator Colin F. Cameron, Jr. and His Contributions to Polishing Technology**

Introduction

Colin F. Cameron, Jr. is a noteworthy inventor based in Delran, NJ, whose contributions have significantly advanced the field of polishing technology. With one registered patent, Cameron has demonstrated innovation in developing a unique polishing pad that serves crucial applications in the semiconductor, magnetic, and optical industries.

Latest Patents

Cameron's patent, titled "Silicate Composite Polishing Pad," presents an innovative solution for polishing various substrates. The invention features a polymeric matrix with a specialized polishing surface. The matrix is incorporated with polymeric microelements that are strategically distributed within the polymer. These microelements contain silicate-containing regions that cover less than 50 percent of their outer surface. Notably, the design minimizes the presence of certain silicate particles, maintaining less than 0.1 weight percent total, ensuring the efficiency and effectiveness of the polishing process.

Career Highlights

Colin F. Cameron, Jr. currently works with Rohm and Haas Electronic Materials Cmp Holdings, Inc., where he leverages his expertise to enhance product development. His innovative approach in materials engineering has established him as a skilled inventor within the organization.

Collaborations

Cameron collaborates with fellow professionals, including Andrew Wank and Donna Marie Alden, to foster innovation within his team. These partnerships enhance research and development processes, ultimately leading to greater advancements in the polishing technology sector.

Conclusion

Colin F. Cameron, Jr. exemplifies the spirit of innovation and dedication in the field of materials engineering. Through his patent of the silicate composite polishing pad, he has contributed meaningfully to the advancement of polishing technologies for critical industries. His work at Rohm and Haas, along with his collaborations, underscores the importance of teamwork and cross-disciplinary cooperation in driving technological progress.

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