Company Filing History:
Years Active: 2007-2008
As a specialist in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can certainly help you with that. Here is a crafted article about inventor Coen Van De Vin based on the provided data:
Title: Unveiling the Innovation of Coen Van De Vin in Lithographic Technology
Introduction:
Coen Van De Vin, a brilliant inventor based in Weert, NL, has made significant contributions to the field of lithographic technology. With an impressive portfolio of two patents, Van De Vin has been at the forefront of developing cutting-edge methods for measuring information about substrates and enhancing focus testing in lithographic apparatus.
Latest Patents:
Van De Vin's latest patents showcase his innovative approach to advancing lithographic processes. The first patent, "Method for measuring information about a substrate," introduces a novel technique involving the projection of light onto a marker on the substrate, enabling precise detection of information while minimizing inaccuracies caused by reflections. The second patent, "Lithographic apparatus focus test method and system," revolutionizes focus testing by introducing a comprehensive method that ensures quality control in lithographic production.
Career Highlights:
Currently affiliated with ASML Netherlands B.V., a renowned leader in the semiconductor industry, Coen Van De Vin continues to drive innovation in lithographic technology. His expertise and dedication have been instrumental in pushing the boundaries of lithography and paving the way for enhanced manufacturing processes.
Collaborations:
Van De Vin's collaborative spirit is evident through his partnerships with esteemed colleagues such as Jan Hauschild and Sanjay Lalbahadoersing. Together, they have synergized their knowledge and skills to develop groundbreaking solutions that have reshaped the landscape of lithographic technology.
Conclusion:
In conclusion, Coen Van De Vin stands as a visionary inventor whose groundbreaking contributions have left an indelible mark on the field of lithographic technology. His relentless pursuit of innovation and commitment to excellence continue to inspire advancements in the semiconductor industry and beyond.
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