Clyde A Fawcett

Title: Clyde A Fawcett: Innovator in Chemical Mechanical Polishing

Introduction

Clyde A Fawcett is a notable inventor based in Claymont, Delaware, recognized for his contributions to the field of chemical mechanical polishing. With a total of 2 patents, Fawcett has made significant advancements in polishing technologies that are essential for semiconductor and optical applications.

Latest Patents

Fawcett's latest patents include innovations in polishing pads designed for various substrates. One of his patents focuses on a chemical mechanical polishing pad that is suitable for planarizing semiconductor, optical, and magnetic substrates. This polishing pad boasts an ultimate tensile strength of at least 3,000 psi (20.7 MPa) and features a polymeric matrix containing closed cell pores. The closed cell pores have an average diameter ranging from 1 to 50 micrometers and represent 1 to 40 volume percent of the polishing pad. Additionally, the pad texture has an exponential decay constant, τ, of 1 to 10 micrometers, resulting from the natural porosity of the polymeric matrix and a surface texture developed through periodic or continuous conditioning with an abrasive. The surface texture is characterized by a half height half width, W, that is less than or equal to the value of τ. Another patent involves porous polyurethane polishing pads, which are useful for polishing semiconductor substrates. This porous polishing pad features a matrix formed from coagulated polyurethane and a non-fibrous polishing layer, which has a polishing surface with a pore count of at least 500 pores per mm that decreases with the removal of the polishing layer. The polishing surface also has a surface roughness Ra between 0.01 and 3 micrometers.

Career Highlights

Clyde A Fawcett has made significant strides in his career, particularly through his work at Rohm and Haas Electronic Materials CMP Holdings, Inc. His expertise in polishing technologies has positioned him as a key figure in the industry.

Collaborations

Fawcett has collaborated with notable coworkers, including T Todd Crkvenac and Kenneth A Prygon, contributing to the development of innovative polishing solutions.

Conclusion

Clyde A Fawcett's contributions to the field of chemical mechanical polishing have established him as a prominent inventor. His patents reflect a commitment to advancing technology in semiconductor and optical applications.