Claughton Miller is a notable inventor based in Hayward, CA, who has made significant contributions to the field of polishing technology. With a total of 2 patents, Miller has developed innovative solutions that enhance the efficiency and effectiveness of polishing processes.

Latest Patents

Miller's latest patents include a "Polishing pad and method of producing same," which describes a transparent pad with a polishing surface that has an average surface roughness of 5 µm or less. This pad features an indentation on its back surface that alters its rate of light transmission, achieving a minimum of 10% light transmission, and preferably 30%, for wavelengths between 350 nm and 900 nm. Another significant patent is the "Layered support and method for laminating CMP pads," which outlines a device and method for laminating Chemical Mechanical Planarization (CMP) pads. This innovation supports the CMP pad with a board made of similar materials, reducing the risk of damage during lamination and improving adhesion.

Career Highlights

Throughout his career, Claughton Miller has worked with prominent companies such as Nihon Micro Coating Co., Ltd. and Mipox International Corporation. His experience in these organizations has allowed him to refine his skills and contribute to advancements in polishing technologies.

Collaborations

Miller has collaborated with notable professionals in the industry, including Ichiro Kodaka and Hisatomo Ohno. These partnerships have fostered innovation and the sharing of ideas, further enhancing the development of his patented technologies.

Conclusion

Claughton Miller's contributions to polishing technology through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry positively, showcasing the importance of innovation in enhancing manufacturing processes.

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