Beijing, China

Chunyi Huang

USPTO Granted Patents = 1 

Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Innovations of Chunyi Huang in Bias Temperature Instability Calculation

Introduction

Chunyi Huang is a notable inventor based in Beijing, China. He has made significant contributions to the field of electronic design automation, particularly in the area of bias temperature instability (BTI) for MOSFET and FinFET devices. His innovative approach has led to the development of a unique method that enhances the reliability and performance of these devices.

Latest Patents

Chunyi Huang holds a patent titled "Method of bias temperature instability calculation and prediction for MOSFET and FinFET." This patent describes a computer-implemented method for BTI calculation that involves simulating the device using an electronic design automation tool. The simulation process includes determining degradation values and recovery values after applying stress sequences over time. This method is crucial for understanding the performance and longevity of MOSFET and FinFET devices.

Career Highlights

Chunyi Huang is currently employed at Cadence Design Systems, Inc., where he applies his expertise in electronic design automation. His work focuses on improving the simulation and analysis of semiconductor devices, contributing to advancements in the industry. His innovative methods have garnered attention for their potential to enhance device reliability.

Collaborations

Chunyi Huang has collaborated with notable colleagues such as Alvin Chen and Jushan Xie. These collaborations have fostered a productive environment for innovation and have led to further advancements in the field of electronic design automation.

Conclusion

Chunyi Huang's contributions to the field of bias temperature instability calculation represent a significant advancement in semiconductor technology. His innovative methods and collaborative efforts continue to influence the industry positively.

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