Beijing, China

Chunlong Li

USPTO Granted Patents = 14 

Average Co-Inventor Count = 3.2

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2012-2018

where 'Filed Patents' based on already Granted Patents

14 patents (USPTO):

Title: The Innovative Contributions of Chunlong Li

Introduction

Chunlong Li is a prominent inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly in the area of material processing. With a total of 14 patents to his name, Chunlong Li has established himself as a key figure in innovation.

Latest Patents

Chunlong Li's latest patents include a novel planarization process. This method involves forming a trench in a material layer that experiences a relatively high loading condition for sputtering. The process further includes sputtering the material layer to achieve a flat surface. Another notable patent is a method for manufacturing a fin structure. This method encompasses forming an initial fin on a substrate, covering it with a dielectric layer, planarizing the dielectric layer through sputtering, and etching the dielectric layer back to expose a portion of the initial fin, which serves as the fin.

Career Highlights

Throughout his career, Chunlong Li has worked at the Chinese Academy of Sciences, where he has contributed to various research projects and technological advancements. His work has been instrumental in developing new methods and processes that enhance material properties and manufacturing techniques.

Collaborations

Chunlong Li has collaborated with notable colleagues, including Chao Zhao and Huilong Zhu. These partnerships have fostered innovation and have led to the successful development of several patents.

Conclusion

Chunlong Li's contributions to technology and innovation are noteworthy. His patents reflect a commitment to advancing material processing techniques, and his collaborations have further enriched the field. His work continues to influence the industry and inspire future innovations.

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