This inventor holds 1 USPTO granted patent. Top assignee: Tenneco (Suzhou) Emission System Co., Ltd.. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Chunhu Lv and Exhaust After-Treatment Innovation.
Introduction.
Chunhu Lv is an inventor associated with Suzhou, China, and Tenneco (Suzhou) Emission System Co., Ltd. His work includes an exhaust after-treatment mixing device designed to improve urea evaporation and gas-flow mixing. The provided information lists 1 patent associated with him.
Latest Patents.
Lv’s listed patent is titled “Exhaust Gas After-Treatment Mixing Device.” The disclosed device has a housing containing a mixing assembly with first, second, and third spaces. The first and second spaces communicate with the third space, while raised portions within the assembly form a fourth space. This arrangement increases the distance and time available for urea evaporation and improves the uniformity of gas-flow mixing.
Career Highlights.
Lv is associated with Tenneco (Suzhou) Emission System Co., Ltd., where his listed patent concerns exhaust after-treatment technology. The invention focuses on the internal arrangement of a mixing assembly to support more effective evaporation and mixing.
Collaborations.
The provided information identifies Shuo Li and Cong Wang as Lv’s coworkers. No further details about their roles or specific contributions to the patent are available.
Conclusion.
Chunhu Lv’s listed invention applies a structured mixing arrangement to address urea evaporation and gas-flow uniformity in exhaust after-treatment systems.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile