The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 30, 2021

Filed:

Jun. 27, 2018
Applicant:

Tenneco (Suzhou) Emission System Co., Ltd., Suzhou, CN;

Inventors:

Cong Wang, Suzhou, CN;

Shuo Li, Suzhou, CN;

Chunhu Lv, Suzhou, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01N 3/28 (2006.01); B01F 5/04 (2006.01);
U.S. Cl.
CPC ...
F01N 3/2892 (2013.01); B01D 2251/2067 (2013.01); B01F 5/0451 (2013.01); F01N 2240/20 (2013.01); F01N 2610/02 (2013.01); F01N 2610/08 (2013.01);
Abstract

The present application discloses an exhaust after-treatment mixing device including a housing and a mixing assembly located within the housing. The mixing assembly includes a first space, a second space and a third space. A top portion of the first space and a top portion of the second space are both in communication with the third space. The mixing assembly is provided with a first raised portion protruding upwardly into the third space and a second raised portion located below the first raised portion. A fourth space is formed between the first raised portion and the second raised portion. As a result, the distance and time for urea evaporation are increased and the uniformity of gas flow mixing is also improved.


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