Tenneco (Suzhou) Emission System Co., Ltd.

Chunhu Lv

Cong Wang

Shuo Li

The present application discloses an exhaust after-treatment mixing device including a housing and a mixing assembly located within the housing. The mixing assembly includes a first space, a second space and a third space. A top portion of the first space and a top portion of the second space are both in communication with the third space. The mixing assembly is provided with a first raised portion protruding upwardly into the third space and a second raised portion located below the first raised portion. A fourth space is formed between the first raised portion and the second raised portion. As a result, the distance and time for urea evaporation are increased and the uniformity of gas flow mixing is also improved.

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Suzhou, China

Chunhu Lv