Company Filing History:
Years Active: 2017-2025
Title: **Innovative Contributions of Chungjong Lee in Plasma Technology**
Introduction
Chungjong Lee, a dedicated inventor based in Miyagi, Japan, has made significant advancements in the field of plasma technology. With a total of two patents to his name, he has demonstrated a remarkable ability to innovate and enhance processes within the semiconductor manufacturing industry.
Latest Patents
Lee's most recent patents include methods that significantly improve the functionality and reliability of plasma tools. His first patent, titled "Tool Health Monitoring and Classifications with Virtual Metrology and Incoming Wafer Monitoring Enhancements," introduces a method for evaluating the health of plasma tools. The innovative approach utilizes a virtual metrology model to predict wafer characteristics, based on measurements from both module sensors and in-situ sensors. Additionally, the classification model identifies various failure modes of the plasma tool, ensuring efficient operation. An initial test for incoming wafers determines their compliance with preset requirements, thus optimizing the manufacturing process.
The second patent, "Method for Etching Organic Film," outlines a unique technique for etching organic films. This method involves generating plasma from a processing gas that contains hydrogen and nitrogen, which transforms a portion of the organic film into a denatured region. Following this, a rare gas plasma is employed to effectively remove the denatured region while managing by-products generated during the etching process. This alternation of plasma generation is a novel approach that enhances the etching efficiency and precision.
Career Highlights
Chungjong Lee currently works at Tokyo Electron Limited, a prominent company in the field of semiconductor manufacturing equipment. His contributions within the organization have fostered advancements in plasma processing technologies and solidified Tokyo Electron’s reputation as a leader in innovation.
Collaborations
Throughout his career, Lee has collaborated with esteemed colleagues, including Takayuki Katsunuma and Masanobu Honda. Their collective efforts reflect a strong commitment to pushing the boundaries of technology and achieving groundbreaking results within their field.
Conclusion
Chungjong Lee's innovative spirit and expertise in plasma technology continue to shape the landscape of semiconductor manufacturing. With his patented methodologies, he not only improves existing processes but also sets new standards for efficiency and reliability in the industry. His work exemplifies the vital role inventors play in driving progress and innovation within advanced technological domains.