Chung-Yih Chen

Title: Innovations by Chung-Yih Chen in Plasma Nitridation Processes

Introduction

Chung-Yih Chen is a notable inventor based in Tai-Nan, Taiwan. He has made significant contributions to the field of plasma nitridation processes, particularly through his innovative methods that enhance efficiency and effectiveness. His work is recognized for its potential impact on various industrial applications.

Latest Patents

Chung-Yih Chen holds a patent for a method titled "Method for switching decoupled plasma nitridation processes of different doses." This method provides a solution for decreasing the switching time between different doses in decoupled plasma nitridation (DPN) processes. The process involves inserting a dummy wafer into a chamber, igniting a process gas into plasma, and performing a DPN doping process on the dummy wafer. This innovative approach allows for rapid adjustment of nitrogen concentration in the chamber, facilitating a seamless transition to the next DPN process. After several cycles, a complete DPN process of the next dose is executed on the dummy wafer, ensuring precision and efficiency.

Career Highlights

Chung-Yih Chen is currently employed at United Microelectronics Corporation, where he continues to develop and refine his innovative techniques. His work at this leading semiconductor company underscores his commitment to advancing technology in the field.

Collaborations

Chung-Yih Chen collaborates with talented individuals such as Ying-Wei Yen and Yun-Ren Wang, who contribute to the innovative environment at United Microelectronics Corporation. Their teamwork fosters creativity and drives the development of cutting-edge solutions in plasma nitridation processes.

Conclusion

Chung-Yih Chen's contributions to the field of plasma nitridation processes exemplify the spirit of innovation. His patented methods not only enhance efficiency but also pave the way for future advancements in semiconductor technology.