United Microelectronics Corp.

Chung-Yih Chen

Shu-Yen Chan

Ying-Wei Yen

Yun-Ren Wang

Chen-Kuo Chiang

A method for switching decoupled plasma nitridation (DPN) processes of different doses, which is able to decrease the switching time, is provided. According to the method, a dummy wafer is inserted into a chamber, a process gas introduced is ignited into plasma, and then a DPN doping process of the next dose is performed on the dummy wafer. The nitrogen concentration of the chamber is thus adjusted rapidly to switch to the DPN process of the next dose. In addition, after several cycles of the above steps are repeated, a dummy wafer is inserted into the chamber, and a complete DPN process of the next dose is performed on the dummy wafer. This process is performed several times before switching to the next DPN process.

Growing community of inventors

Tai-Nan, Taiwan

Chung-Yih Chen