Chung-I Huang

Title: Chung-I Huang: Innovator in Fusible Structures

Introduction

Chung-I Huang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of fusible structures. With a total of 5 patents to his name, Huang's work has had a notable impact on the industry.

Latest Patents

Huang's latest patents include innovative designs for fusible structures. One of his patents describes a fusible structure that consists of a metal line in a first metal layer extending along a first direction. This structure also features a first dummy structure positioned proximal to the metal line in a second direction, which is perpendicular to the first direction. The design includes various portions of the metal line, with differing thicknesses that enhance its functionality. Another patent outlines methods for manufacturing these fusible structures, detailing the process of forming a metal line and configuring a mask to achieve specific thicknesses for different portions.

Career Highlights

Throughout his career, Chung-I Huang has worked with notable organizations, including Taiwan Semiconductor Manufacturing Company and National Applied Research Laboratories. His experience in these companies has allowed him to refine his expertise in semiconductor manufacturing and innovation.

Collaborations

Huang has collaborated with esteemed colleagues such as Shao-Ting Wu and Meng-Sheng Chang. These partnerships have contributed to the advancement of technology in their respective fields.

Conclusion

Chung-I Huang is a distinguished inventor whose work in fusible structures has paved the way for advancements in semiconductor technology. His patents and collaborations reflect his commitment to innovation and excellence in the industry.