This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2016
Title: Chung-Hsien Tsai: Innovator in Semiconductor Technology
Introduction
Chung-Hsien Tsai is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure and method for forming the same.
Latest Patents
Chung-Hsien Tsai holds 1 patent for his invention titled "Semiconductor structure and method for forming the same." This patent describes a method that includes several steps. A gate electrode layer is formed on a substrate. A spacer structure is created on the sidewall of the gate electrode layer. Additionally, a dielectric cap film is formed to cover both the gate electrode layer and the spacer structure. The method also involves performing a source/drain implantation on the substrate, with the dielectric cap film exposed to the conditions of the implantation.
Career Highlights
Chung-Hsien Tsai is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to further his research and development in semiconductor technologies.
Collaborations
Chung-Hsien Tsai has collaborated with notable colleagues, including Yu-Hsiang Lin and Wei-Chih Chen. Their teamwork has contributed to advancements in semiconductor innovations.
Conclusion
Chung-Hsien Tsai is a key figure in semiconductor technology, with a focus on innovative structures and methods. His contributions continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile