Chung-Hsi J Wu

Title: Innovations of Chung-Hsi J Wu

Introduction

Chung-Hsi J Wu is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work primarily focuses on lithography masks and methods of manufacture, which are crucial in the production of semiconductor devices.

Latest Patents

Among his latest patents, Wu has developed innovative masks and methods of manufacture thereof. These patents disclose lithography masks and methods of generating assist features for these masks. A preferred embodiment includes a method of generating an assist feature of a lithography mask. The method involves providing a layout for a material layer of a semiconductor device, which includes a pattern for at least one feature of the semiconductor device. Furthermore, the method includes forming an assist feature in the pattern for the at least one feature, wherein the assist feature extends completely through the pattern for the at least one feature.

Career Highlights

Throughout his career, Chung-Hsi J Wu has worked with prominent companies in the technology sector. He has been associated with International Business Machines Corporation (IBM) and Infineon Technologies AG. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Wu has collaborated with several professionals in his field, including Uwe Paul Schroeder and Timothy A Brunner. These collaborations have likely enhanced his research and development efforts, leading to his successful patent applications.

Conclusion

Chung-Hsi J Wu is a distinguished inventor whose work in lithography masks has advanced semiconductor manufacturing techniques. His contributions are recognized through his patents and collaborations with leading technology companies.