The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Dec. 03, 2002
Applicants:
Waikin LI, Poughkeepsie, NY (US);
Chung-hsi Wu, Wappingers Falls, NY (US);
Inventors:
Waikin Li, Poughkeepsie, NY (US);
Chung-Hsi Wu, Wappingers Falls, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/26 ;
U.S. Cl.
CPC ...
Abstract
A method to enhance resolution of a chemically amplified photoresist generally includes forming a relief image in the chemically amplified photoresist, wherein the relief image comprises a feature having a first dimension; and contacting the relief image with an aqueous acidic solution for a period of time effective to reduce first dimension of the relief image to a second dimension.