The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Dec. 06, 2006
Uwe Paul Schroeder, Lake Carmel, NY (US);
Chung-hsi J. Wu, Wappingers Falls, NY (US);
Uwe Paul Schroeder, Lake Carmel, NY (US);
Chung-Hsi J. Wu, Wappingers Falls, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Infineon Technologies AG, Munich, DE;
Abstract
Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment includes a method of generating an assist feature of a lithography mask. The method includes providing a layout for a material layer of a semiconductor device, the layout including a pattern for at least one feature of the semiconductor device. The method includes forming an assist feature in the pattern for the at least one feature, wherein the assist feature extends completely through the pattern for the at least one feature.