Company Filing History:
Years Active: 2007-2013
Title: Innovations of Chung-Hee Park
Introduction
Chung-Hee Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate support technology, holding a total of 5 patents. His work focuses on improving the efficiency and effectiveness of substrate supports used in various applications.
Latest Patents
Chung-Hee Park's latest patents include innovative methods for reducing electrostatic charge and improving uniform deposition thickness on glass substrates. One of his patents describes a substrate support that features an electrically conductive body with a substrate support surface covered by an electrically insulative coating. This coating has a surface finish ranging from about 200 to about 2000 micro-inches. Another patent outlines a method for supporting a glass substrate, which involves creating an anodization layer on an aluminum body to enhance the substrate contact area.
Career Highlights
Chung-Hee Park is currently employed at Applied Materials, Inc., where he continues to develop cutting-edge technologies in substrate support systems. His expertise in this area has led to advancements that benefit various industries, particularly in semiconductor manufacturing.
Collaborations
Throughout his career, Chung-Hee Park has collaborated with talented individuals such as Soo Young Choi and Dong-Kil Yim. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Chung-Hee Park's contributions to substrate support technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the challenges in the field and provide effective solutions that enhance manufacturing processes.