This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: United Microelectronics Corp.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: **Chun-Yi Wang: Innovator in Deposition Chamber Technology**
Introduction
Chun-Yi Wang, located in Chang-Hua Hsien, Taiwan, is an accomplished inventor known for his significant contribution to the field of semiconductor manufacturing. With a focus on enhancing the efficiency of deposition processes, Wang has secured a patent that showcases his innovative approach in this specialized area.
Latest Patents
Wang holds a patent titled "Method of Cleaning Deposition Chamber," which delineates a unique process for cleaning deposition chambers used in semiconductor fabrication. This method involves the introduction of a fluorine-containing gas into the chamber, where it is maintained at a specific pressure. The process further includes igniting plasma with RF power and maintaining the chamber at a predetermined temperature, effectively cleaning the interior surfaces without the need for evacuation, thanks to a remote plasma source that introduces free fluorine.
Career Highlights
Wang is currently affiliated with United Microelectronics Corporation, a leading global semiconductor foundry. His expertise and innovative work have contributed significantly to advancements in manufacturing processes, particularly in the cleaning of deposition chambers, which is crucial for maintaining the quality of semiconductor devices.
Collaborations
Throughout his career, Chun-Yi Wang has collaborated with fellow inventor Chien-Hsin Lai. Their joint efforts in research and development have facilitated the innovation of new methods and technologies within the semiconductor industry, enhancing process efficiency and effectiveness.
Conclusion
Chun-Yi Wang exemplifies the spirit of innovation through his dedicated work in semiconductor manufacturing. His patented method for cleaning deposition chambers not only addresses critical challenges in the industry but also reflects his commitment to advancing technology in an essential field. Wang's contributions, facilitated by his collaboration with peers and his role in a prominent corporation, will undoubtedly continue to influence the semiconductor manufacturing landscape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
