The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Apr. 19, 2006
Chien-hsin Lai, Kao-Hsiung Hsien, TW;
Chun-yi Wang, Chang-Hua Hsien, TW;
Chien-Hsin Lai, Kao-Hsiung Hsien, TW;
Chun-Yi Wang, Chang-Hua Hsien, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
A process for cleaning a deposition chamber. The process includes feeding a fluorine-containing gas into the deposition chamber; maintaining the fluorine-containing gas in the deposition chamber at a first pressure; providing RF power to ignite plasma of the fluorine-containing gas within the deposition chamber; keeping the deposition chamber at a first temperature for a time period with the presence of the plasma; turning off the RF power to cease the plasma; and feeding a remote plasma containing free fluorine from a remote plasma source into the deposition chamber, without evacuating the deposition chamber, at the first temperature to clean interior surfaces of the deposition chamber.