Chun-Yi Huang

Title: The Innovations of Chun-Yi Huang

Introduction

Chun-Yi Huang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on advanced fabrication methods and transmission systems, showcasing his expertise in engineering and innovation.

Latest Patents

One of his latest patents is titled "Methods of fabricating Fin Field Effect Transistor (FinFET) devices with uniform tension using implantations on top and sidewall of Fin." This patent describes a method that includes forming a fin over a substrate, implanting a first dopant on the top surface of the fin, and implanting a second dopant on the sidewall surface of the fin. The first dopant is different from the second dopant, and the method further includes forming an oxide layer on both surfaces and a gate electrode layer over the oxide layer. Another notable patent is for a "Multi-level point-to-point transmission system and transmitter circuit and receiver circuit thereof." This invention includes a transmitter circuit that generates a first reference current and a receiver circuit that judges a voltage at the receiving terminal to accurately receive transmission data.

Career Highlights

Chun-Yi Huang has worked with notable companies in the semiconductor industry, including Novatek Microelectronics Corporation and Taiwan Semiconductor Manufacturing Company Limited. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

He has collaborated with talented individuals such as Tsung-Han Wu and Tong-Min Weng, further enhancing his work and expanding the impact of his inventions.

Conclusion

Chun-Yi Huang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods and systems continue to shape the future of the industry.