Chun-Jen Hsiao

Title: Innovations of Chun-Jen Hsiao in Semiconductor Technology

Introduction

Chun-Jen Hsiao is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of plasma ashing methods. With a total of 2 patents to his name, Hsiao's work has been instrumental in advancing processes used in semiconductor manufacturing.

Latest Patents

Hsiao's latest patents include a plasma ashing method using a residue gas analyzer and a photoresist removal method using a residue gas analyzer. The plasma ashing method involves analyzing the process status of various semiconductor substrate models undergoing a tested plasma ash process. This method utilizes multiple tested recipes to optimize the plasma ash process. The photoresist removal method similarly analyzes the process status of semiconductor substrate models and selects a process recipe based on analysis results and expected performance criteria. This innovative approach enhances the efficiency of removing photoresist layers from semiconductor substrates.

Career Highlights

Chun-Jen Hsiao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to collaborate with other talented professionals and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Hsiao has worked alongside notable colleagues, including Ya-Ping Chen and Chien-Hung Lin. Their collaborative efforts have further enriched the innovative environment at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Chun-Jen Hsiao's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the field. His advancements in plasma ashing methods are paving the way for more efficient semiconductor manufacturing processes.