Location History:
- Taipei Hsien, TW (2009)
- Taipei County, TW (2010)
Company Filing History:
Years Active: 2009-2010
Title: Innovations by Chun-Hung Hsia
Introduction
Chun-Hung Hsia is a notable inventor based in Taipei County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods related to wafer processing. With a total of 2 patents, Hsia's work has had a considerable impact on the industry.
Latest Patents
Chun-Hung Hsia's latest patents include a method of cleaning a reaction chamber and a method of preventing a peeling issue of a high stressed thin film. The first patent describes a process where the reaction chamber is cleaned using a cleaning gas. Following this, a protection film is formed on the inner surface of the chamber, creating a gap between the protection wafer and the wafer holder, while a cooling gas is guided simultaneously. The second patent addresses the issue of peeling in high stressed thin films. In this method, a wafer with a high stressed thin film is lifted, and a pre-heating process is performed while it is elevated. Subsequently, a dielectric layer is deposited on the high stressed thin film.
Career Highlights
Chun-Hung Hsia is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work at this organization has allowed him to develop and refine his innovative techniques, contributing to advancements in wafer processing technology.
Collaborations
Some of his notable coworkers include Chih-Jen Mao and Kuo-Wei Yang. Their collaboration has likely fostered an environment of innovation and creativity within their projects.
Conclusion
Chun-Hung Hsia's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as a significant inventor in the field. His innovative methods continue to influence the industry and pave the way for future advancements.