The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Sep. 26, 2006
Chih-jen Mao, Tainan County, TW;
Chun-hung Hsia, Taipei County, TW;
Ta-ching Yang, Changhua County, TW;
Chun-cheng Yu, Tainan, TW;
Chien-fu Chu, Hsinchu, TW;
Kuo-wei Yang, Hsinchu, TW;
Chun-han Chuang, Hsinchu, TW;
Hui-shen Shih, Changhua Hsien, TW;
Chih-Jen Mao, Tainan County, TW;
Chun-Hung Hsia, Taipei County, TW;
Ta-Ching Yang, Changhua County, TW;
Chun-Cheng Yu, Tainan, TW;
Chien-Fu Chu, Hsinchu, TW;
Kuo-Wei Yang, Hsinchu, TW;
Chun-Han Chuang, Hsinchu, TW;
Hui-Shen Shih, Changhua Hsien, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of cleaning a reaction chamber having a wafer holder is provided. First, the reaction chamber is cleaned by a cleaning gas. Next, a protection film is formed on the inner surface of the reaction chamber, wherein a gap is formed between the protection wafer and the wafer holder, and a cooling gas is guided therebetween simultaneously.