Location History:
- Portland, OR (US) (2016 - 2018)
- Albuquerque, NM (US) (2023)
Company Filing History:
Years Active: 2016-2025
Title: Innovations of Chul-Hyun Lim
Introduction
Chul-Hyun Lim is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor devices.
Latest Patents
One of Chul-Hyun Lim's latest patents is the Vertical Edge Blocking (VEB) technique for increasing patterning process margin. This invention includes methods for fabricating semiconductor devices, which involve forming gratings of parallel lines and utilizing conformal mask layers. The process is designed to improve the precision of semiconductor manufacturing, thereby enhancing device performance.
Career Highlights
Chul-Hyun Lim is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His role at Intel allows him to work on cutting-edge technologies that drive innovation in the industry. His expertise in semiconductor devices has positioned him as a valuable asset to the company.
Collaborations
Chul-Hyun Lim collaborates with talented individuals such as Seiyon Kim and Daniel A. Simon. These collaborations foster an environment of innovation and creativity, leading to advancements in semiconductor technology.
Conclusion
Chul-Hyun Lim's contributions to semiconductor technology through his patents and work at Intel Corporation highlight his importance in the field. His innovative techniques continue to shape the future of semiconductor manufacturing.