Zhubei, Taiwan

Chuan Sheng Tu

This inventor holds 1 USPTO granted patent. Top assignee: Nanometrics Inc.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chuan Sheng Tu. Retrieved from https://idiyas.com/inventor/chuan-sheng-tu-zb4y522n

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: The Innovations of Chuan Sheng Tu

Introduction

Chuan Sheng Tu is a notable inventor based in Zhubei, Taiwan. He has made significant contributions to the field of optical metrology, showcasing his expertise through his innovative patent.

Latest Patents

Chuan Sheng Tu holds a patent for an invention titled "Optical metrology with purged reference chip." This integrated metrology module features a chuck for holding a sample and positioning it with respect to an optical metrology device. The invention includes a reference chip that is movable to various positions relative to the optical metrology device. Additionally, a reference chip purge device provides a flow of purge gas or air over the reference chip while it is in these various positions. The reference chip purge device can be either static or movable along with the reference chip.

Career Highlights

Chuan Sheng Tu is currently employed at Nanometrics Inc., where he continues to develop and refine his innovative ideas. His work in optical metrology has positioned him as a key player in the industry.

Collaborations

Chuan Sheng Tu has collaborated with notable colleagues, including Andrew Saul Klassen and Andrew J Hazelton, contributing to a dynamic work environment that fosters innovation.

Conclusion

Chuan Sheng Tu's contributions to optical metrology through his patent and work at Nanometrics Inc. highlight his role as an influential inventor in the field. His innovative approach continues to advance the technology in metrology applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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