Chuan-Huai Chen

Title: Chuan-Huai Chen and Advances in Sputter-Etching Equipment.

Introduction

Chuan-Huai Chen is an inventor associated with Taipei, Taiwan, and Taiwan Semiconductor Manufacturing Company Limited. His patent work includes improvements to single-wafer sputter-etching chambers, with a focus on reducing particulate contamination and improving process uniformity. Chen is credited with 4 patents.

Latest Patents

“Arc-Sprayed Shield for Pre-Sputter Etching Chamber” describes coating the interior of a sputtering shield with a rough, arc-sprayed material, such as aluminum. The coating helps reduce contamination from deposited particles. The patent also describes the coating process and presents comparisons of particle counts and product yield before and after its adoption.

“Sputter Etching Chamber with Improved Uniformity” addresses uneven material removal and particulate contamination through an improved gas baffle. Its smooth surface helps distribute incoming sputtering gas more uniformly, reducing local pressure fluctuations that can affect etching rates and contribute to contamination. The patent also describes the baffle’s design and its attachment to the sputtering shield.

Career Highlights

Chen’s listed inventions focus on practical equipment improvements for semiconductor manufacturing. His work on shield coatings and gas-baffle design targets two important process concerns: particle control and consistent material removal.

Collaborations

Chen’s listed coworkers include Cheng-Kun Lin and Chin-Shien Yang. His work is associated with Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Chuan-Huai Chen’s patents address key challenges in sputter etching by improving chamber cleanliness and process uniformity, contributing to more reliable semiconductor manufacturing.