Fremont, CA, United States of America

Chu-Tsao Yen

This inventor holds 6 USPTO granted patents. Top assignee: Integrated Device Technology, Inc.. Active years: 1998-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chu-Tsao Yen. Retrieved from https://idiyas.com/inventor/chu-tsao-yen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 5

Forward Citations = 102(Granted Patents)


Company Filing History:


Years Active: 1998-2001

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Chu-Tsao Yen

Introduction

Chu-Tsao Yen is a prominent inventor based in Fremont, CA, known for his significant contributions to semiconductor technology. With a total of 6 patents to his name, Yen has made remarkable advancements in the field of integrated circuits.

Latest Patents

Yen's latest patents include innovative designs that enhance the performance of semiconductor structures. One of his notable inventions is the "Air gap with borderless contact," which describes a semiconductor structure featuring a first conductive trace adjacent to a second conductive trace over an insulating layer. This design incorporates a dielectric material positioned between the traces, with a borderless contact extending through the dielectric to connect with the first conductive trace. The introduction of an air gap between the traces significantly increases capacitance, optimizing the performance of the semiconductor device.

Another significant patent is the "Method of forming air gaps for reducing interconnect capacitance." This method enhances the aspect ratio of electrical conductor members by increasing their effective height. The process involves forming a thicker layer of conductor material or adding a capping dielectric layer before patterning. The resulting structure is covered by a dielectric layer that creates voids and open spaces, effectively reducing the dielectric constant between the patterned conductors. A plasma etchback is then employed to further shape these voids, followed by the deposition of a second dielectric layer to seal the structure.

Career Highlights

Yen has built a successful career at Integrated Device Technology, Inc., where he has been instrumental in developing cutting-edge semiconductor technologies. His work has significantly impacted the efficiency and performance of integrated circuits, making him a valuable asset to the company.

Collaborations

Throughout his career, Yen has collaborated with esteemed colleagues, including Chuen-Der Lien and Shih-Ked Lee. These partnerships have fostered innovation and contributed to the advancement of semiconductor technology.

Conclusion

Chu-Tsao Yen's innovative patents and contributions to the field of semiconductor technology highlight his expertise and dedication to advancing integrated circuits. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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