This inventor holds 2 USPTO granted patents. Top assignees: Axcelis Technologies, Inc., Tel Epion Corporation. Active years: 2007-2012.
Company Filing History:
Years Active: 2007-2012
Title: The Innovative Contributions of Christopher T Reddy
Introduction
Christopher T Reddy is a notable inventor based in Groveland, MA (US). He has made significant contributions to the field of ion implantation technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of gas cluster ion beam systems and ion implanters.
Latest Patents
One of Reddy's latest patents is for a "Gas cluster ion beam system with rapid gas switching apparatus." This innovative processing system is designed for irradiating a substrate with a gas cluster ion beam (GCIB). The system features a nozzle that forms and emits gas cluster beams through an outlet, along with a stagnation chamber located upstream of the nozzle. The nozzle directs a single gas cluster beam toward the substrate, while an ionizer downstream ionizes the gas cluster beam to create the GCIB. Additionally, the system includes a gas supply that communicates with the stagnation chamber's inlet, featuring a gas source and a valve to control gas flow.
Another significant patent by Reddy involves "Removing byproducts of physical and chemical reactions in an ion implanter." This invention pertains to an ion implanter equipped with a source, a workpiece support, and a transport system for delivering ions to an ion implantation chamber. The implanter includes removable inserts that collect material entering the transport system or ion implantation chamber due to collisions between ions and the workpiece. A temperature control mechanism is coupled to these inserts to maintain a controlled temperature, promoting film formation during ion treatment.
Career Highlights
Throughout his career, Christopher T Reddy has worked with prominent companies in the technology sector, including Axcelis Technologies, Inc. and Tel Epion Corporation. His experience in these organizations has contributed to his expertise in ion implantation and related technologies.
Collaborations
Reddy has collaborated with several professionals in his field, including Maria J Anc and Dale K Stone. These collaborations have likely enriched his work and contributed to the development of his innovative patents.
Conclusion
Christopher T Reddy's contributions to the field of ion implantation and gas cluster ion beam technology are noteworthy. His patents reflect a commitment to advancing technology and improving processes in the industry. His work continues to influence the field and inspire future innovations.