Christopher R Ryder

Title: Innovations by Christopher R Ryder

Introduction

Christopher R Ryder is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of integrated circuit structures and capacitors. With a total of 2 patents, his work has advanced the technology used in electronic devices.

Latest Patents

One of Ryder's latest patents is focused on multi-layer etch stop layers for advanced integrated circuit structure fabrication. This patent describes an integrated circuit structure that includes a conductive line in a first interlayer dielectric material above a substrate. The structure features a first dielectric etch stop layer, a second dielectric layer, and a third dielectric layer positioned on the conductive line and the first interlayer dielectric material. Additionally, a second interlayer dielectric material is placed on the third dielectric etch stop layer, with an opening that allows for a conductive structure to be in direct contact with the conductive line.

Another significant patent by Ryder is related to metal insulator metal (MIM) capacitors. This patent outlines a capacitor design that includes a first electrode plate and a first capacitor dielectric on the first electrode plate. The design continues with a second electrode plate that is parallel to the first, along with a series of dielectric layers that enhance the capacitor's functionality.

Career Highlights

Christopher R Ryder is currently employed at Intel Corporation, where he applies his expertise in semiconductor technology. His work at Intel has positioned him as a key player in the development of advanced electronic components.

Collaborations

Ryder has collaborated with notable colleagues such as David J Towner and Dragos Seghete. These collaborations have contributed to the innovative projects and patents that enhance the capabilities of modern electronics.

Conclusion

Christopher R Ryder's contributions to the field of electronics through his patents and work at Intel Corporation highlight his role as an influential inventor. His innovations in integrated circuit structures and capacitors continue to shape the future of technology.