Christoph Stahr

Title: Christoph Stahr: Innovator in Sputtering Technology

Introduction

Christoph Stahr is a notable inventor based in Kahl am Main, Germany. He has made significant contributions to the field of sputtering technology, holding a total of 2 patents. His work focuses on developing advanced materials that enhance the efficiency and effectiveness of sputtering processes.

Latest Patents

Stahr's latest patents include innovative designs for sputtering targets. The first patent describes a tube-shaped sputtering target that features a carrier tube with an indium-based sputtering material. This sputtering material is characterized by a microstructure with a mean grain size of less than 1 mm, measured on the sputtering-roughened surface. The second patent presents a sputtering target that ensures the production of consistently homogeneous layers of sputtering material throughout its lifespan. This target comprises a mixture of oxides of indium, zinc, and gallium, including at least one ternary mixed oxide and one amorphous phase, with specific weight percentages for optimal performance.

Career Highlights

Christoph Stahr is currently employed at Heraeus Deutschland GmbH & Co. KG, a leading company in the field of materials technology. His role involves researching and developing innovative sputtering materials that meet the demands of modern applications. His expertise in this area has positioned him as a key player in the industry.

Collaborations

Stahr collaborates with several talented professionals, including Martin Schlott and Christoph Simons. These collaborations enhance the innovation process and contribute to the development of cutting-edge technologies in sputtering.

Conclusion

Christoph Stahr's contributions to sputtering technology through his patents and work at Heraeus Deutschland GmbH & Co. KG highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of materials technology.