The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Oct. 06, 2011
Andreas Herzog, Bruchköbel, DE;
Sabine Schneider-betz, Dreieich, DE;
Martin Schlott, Offenbach, DE;
Christoph Stahr, Kahl am Main, DE;
Andreas Herzog, Bruchköbel, DE;
Sabine Schneider-Betz, Dreieich, DE;
Martin Schlott, Offenbach, DE;
Christoph Stahr, Kahl am Main, DE;
Heraeus Deutschland GmbH & Co. KG, Hanau, DE;
Abstract
A sputtering target is provided which ensures the production of unvaryingly homogenous layers of the sputtering material during the lifespan of the sputtering target. The sputtering target includes a mixture of oxides of indium, zinc, and gallium, the mixture containing at least one ternary mixed oxide of indium, zinc, and gallium and at least one amorphous phase. The portion of ternary mixed oxides of indium, zinc, and gallium is at least 50 weight percent, relative to the total weight of the mixture, and the portion of amorphous phase is at least 20 weight percent, relative to the total weight of the mixture.