Christie R Marrian

Title: Christie R. Marrian: Innovator in Lithography Technology

Introduction

Christie R. Marrian is a notable inventor based in Marbury, MD (US), recognized for his contributions to lithography technology. With a total of 12 patents to his name, Marrian has made significant advancements in the field, particularly in electronic mask fabrication and e-beam lithography.

Latest Patents

One of his latest patents is the "Lithographic mask and method for fabrication thereof." This innovation improves resolution in terms of minimum feature sizes and proximity effects in electronic masks. The mask is created using a high voltage electron beam that deflects or blocks backscattered electrons. The novel structure includes a transparent support, an absorber layer, a dielectric layer, and a resist layer. The dielectric layer is credited with enhancing resolution, allowing the mask to be used multiple times for various applications, including electronic devices and integrated circuits.

Another significant patent is the "Bright beam method for super-resolution in e-beam lithography." This method and apparatus bond a layer of coating material onto a substrate with minimal bulk heating. A pulsed electron beam generator produces high energy electrons at the beginning of the pulse and a larger number of lower energy electrons at the end. A thin sacrificial layer of easily-vaporized material, such as tin, is placed on top of the coating. The high energy electrons penetrate through the layers, heating the ablative layer to a molten state, which then vaporizes. This ablation process generates a force that drives the coating layer into the substrate.

Career Highlights

Throughout his career, Christie R. Marrian has worked with various organizations, including the USA as represented by the Secretary of the Navy. His work has significantly impacted the field of lithography, particularly in enhancing the capabilities of electronic masks and e-beam lithography techniques.

Collaborations

Marrian has collaborated with notable individuals in his field, including Martin C. Peckerar and Elizabeth Ann Dobisz. Their combined expertise has contributed to the advancements in lithography technology.

Conclusion

Christie R. Marrian's innovative work in lithography has led to significant advancements in electronic mask fabrication and e-beam lithography. His contributions continue to influence the development of technologies used in electronic devices and integrated circuits.