The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 1996
Filed:
Jun. 30, 1993
Christie R Marrian, Marbury, MD (US);
Eric S Snow, Springfield, VA (US);
Elizabeth A Dobisz, Owings, MD (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
An apparatus and method lithographically patterns an imaging layer using a predetermined pattern. The apparatus includes a cantilever having a tip attached thereto, which tip includes a conductive or semiconductive material. The apparatus also includes a scanning probe controller connected to the cantilever, which maintains the tip in contact with the imaging layer to be patterned. Substantially while the scanning probe controller maintains the tip in contact with the imaging layer, a voltage and/or current generator coupled to the tip selectively generates a voltage and/or current between the tip and the imaging layer to affect a physical change in the imaging layer based on the predetermined pattern. The physical change in the imaging layer can be exploited to fabricate integrated circuits, lithographic masks or micromechanical devices, for example. The scanning probe controller can also measure the topographical change in the imaging layer caused by the physical change using the same cantilever and tip.