The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 1994
Filed:
May. 13, 1992
Elizabeth A Dobisz, Owings, MD (US);
Christie R Marrian, Marbury, MD (US);
Martin C Peckerar, Silver Springs, MD (US);
Kee W Rhee, Silver Springs, MD (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
Improvement of resolution in terms of reducing minimum feature sizes and ximity effects on bulk substrates in high voltage electron beam lithography as applied to manufacture of electronic circuits from coated semiconductors involves the use of a dielectric layer interposed between an electrically semiconducting substrate and a resist layer. The dielectric layer functions to reduce the resist exposure resulting from the backscattered electrons coming from the substrate into the resist layer.