Silver Spring, MD, United States of America

Kee W Rhee


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 42(Granted Patents)


Location History:

  • Silver Springs, MD (US) (1994)
  • Silver Spring, MD (US) (2000)

Company Filing History:


Years Active: 1994-2000

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2 patents (USPTO):Explore Patents

Title: Kee W Rhee: Innovator in Electron Beam Lithography

Introduction

Kee W Rhee is a notable inventor based in Silver Spring, MD (US), recognized for his contributions to the field of electron beam lithography. He holds 2 patents that focus on improving resolution in electronic mask fabrication and lithography processes. His work has significant implications for the manufacturing of electronic devices and integrated circuits.

Latest Patents

One of Kee W Rhee's latest patents is titled "Lithographic mask and method for fabrication thereof." This invention enhances resolution by utilizing a high voltage electron beam that deflects or blocks backscattered electrons. The innovative mask structure includes a transparent support, an absorber layer, a dielectric layer, and a resist layer. The dielectric layer is crucial for improving resolution, allowing the mask to be used multiple times for various applications.

Another significant patent is the "Method and system for electron beam lithography." This invention addresses the challenge of reducing minimum feature sizes and proximity effects on bulk substrates. By interposing a dielectric layer between an electrically semiconducting substrate and a resist layer, the invention minimizes resist exposure from backscattered electrons, thereby enhancing the manufacturing process of electronic circuits.

Career Highlights

Kee W Rhee is currently associated with the USA as represented by the Secretary of the Navy. His work in this capacity has allowed him to contribute to advancements in lithography techniques that are essential for modern electronics.

Collaborations

Throughout his career, Kee W Rhee has collaborated with notable colleagues, including Martin C Peckerar and Christie R Marrian. These collaborations have further enriched his research and development efforts in the field of electron beam lithography.

Conclusion

Kee W Rhee's innovative work in electron beam lithography has made a significant impact on the manufacturing of electronic devices. His patents reflect a deep understanding of the complexities involved in lithography processes, paving the way for advancements in technology.

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