Company Filing History:
Years Active: 2017-2020
Title: The Innovative Contributions of Christian Roehrig
Introduction
Christian Roehrig is a notable inventor based in Plainfield, IL (US). He has made significant contributions to the field of precision nanopositioning, holding a total of 3 patents. His work focuses on enhancing the performance and stability of nanopositioning systems, which are crucial in various high-precision applications.
Latest Patents
One of his latest patents is titled "Method and precision nanopositioning apparatus with compact vertical and horizontal linear nanopositioning flexure stages for implementing enhanced nanopositioning performance." This invention provides an advanced method and apparatus that includes both vertical and horizontal linear nanopositioning flexure stages. The design features a symmetrically configured flexure linear guiding mechanism that enhances precision motion.
Another significant patent is the "Method and apparatus for implementing ultra-high stability long-vertical travel stage." This invention incorporates a first wedge supporting a second wedge, both made from stable materials with low thermal expansion coefficients. The design also includes integrated air bearings and a linear guiding mechanism with multiple flexures, allowing for vertical motion with high stability.
Career Highlights
Christian Roehrig is currently employed at UChicago Argonne, LLC, where he continues to innovate in the field of nanopositioning technology. His work is characterized by a commitment to enhancing the performance and reliability of precision instruments.
Collaborations
Throughout his career, Christian has collaborated with esteemed colleagues, including Barry Lai and Jorg M. Maser. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.
Conclusion
Christian Roehrig's contributions to precision nanopositioning technology demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a deep understanding of the complexities involved in achieving high precision and stability in engineering applications.