This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Christian Preischl: Innovator in Lithography Technology
Introduction
Christian Preischl is a notable inventor based in Mainz, Germany. He has made significant contributions to the field of lithography through his innovative methods and apparatuses. His work is particularly focused on enhancing the efficiency and effectiveness of lithographic processes.
Latest Patents
Christian Preischl holds a patent for a "Method and apparatus for mask repair." This invention pertains to methods, apparatuses, and computer programs for processing an object for lithography. The method involves providing a first gas and a second gas, which includes molecules capable of performing an inversion oscillation. Additionally, it incorporates a particle beam in a working region of the object to produce a deposition material based on the gases provided. The second gas is delivered at a flow rate of less than 5 sccm, with preferred rates being less than 2 sccm and more than 0.5 sccm.
Career Highlights
Christian Preischl is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography. His role at the company allows him to apply his innovative ideas and contribute to advancements in lithography technology.
Collaborations
Christian has collaborated with notable colleagues, including Johann-Christoph Von Saldern and Daniel Rhinow. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in the industry.
Conclusion
Christian Preischl's contributions to lithography through his patent and work at Carl Zeiss SMT GmbH highlight his role as an influential inventor in the field. His innovative methods continue to shape the future of lithographic processes.