The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Feb. 08, 2023
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Daniel Rhinow, Frankfurt am Main, DE;
Christian Felix Hermanns, Frankfurt am Main, DE;
Johann-Christoph Von Saldern, Jena, DE;
Hubertus Marbach, Grossostheim, DE;
Nicole Auth, Ginsheim-Gustavsburg, DE;
Bartholomaeus Szafranek, Ober-Ramstadt, DE;
Christian Preischl, Mainz, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The present invention pertains to methods, apparatuses and computer programs for processing an object for lithography. A method for processing an object for lithography comprises: (a) providing a first gas; (b) providing a second gas, the second gas including second molecules capable of performing an inversion oscillation; (c) providing a particle beam in a working region of the object for production of a deposition material in the working region based at least partly on the first gas and the second gas. The second gas is provided with a gas flow rate of less than 5 sccm, preferably less than 2 sccm, more preferably less than 0.5 sccm.