Christian F Schaus is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is the "Radial epitaxial reactor for multiple wafer growth." This invention features an improved gas distribution scheme for a multi-wafer radially injected convergent horizontal epitaxial reactor. It includes two outer distribution rings, an outer injection ring, an annular susceptor, and a central exhaust tube. The design compensates for the depletion of reactant gases along the substrate, ensuring efficient gas flow. The compact design also allows for water cooling of the quartz during deposition and includes a resistive bakeout furnace for cleaning the reaction chamber between runs.

Another significant patent is the "Wavelength-resonant surface-emitting semiconductor laser." This invention discloses a wavelength resonant semiconductor gain medium characterized by multiple quantum-well gain regions separated by semiconductor spacer regions of higher bandgap. The design is tailored to interact with radiation, making it suitable for use as a laser medium in single devices or arrays.

Career Highlights

Christian F Schaus is affiliated with the University of New Mexico, where he continues to advance research in semiconductor technologies. His work has been instrumental in developing innovative solutions that enhance the efficiency and performance of semiconductor devices.

Collaborations

He has collaborated with esteemed colleagues such as Steven Roy Julien Brueck and Marek A Osinski, contributing to a rich environment of innovation and research.

Conclusion

Christian F Schaus exemplifies the spirit of innovation in semiconductor technology through his patents and collaborations. His contributions continue to influence the field and inspire future advancements.