Boise, ID, United States of America

Chris W Hill

USPTO Granted Patents = 27 

Average Co-Inventor Count = 1.6

ph-index = 6

Forward Citations = 136(Granted Patents)


Company Filing History:


Years Active: 2000-2013

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27 patents (USPTO):Explore Patents

Title: Chris W. Hill: Innovator in Semiconductor Technologies

Introduction

Chris W. Hill, based in Boise, Idaho, is a prominent inventor with a remarkable portfolio of 27 patents. His work focuses on advancements in semiconductor technology, particularly in methods that enhance the efficiency and quality of component fabrication.

Latest Patents

Among his latest patents is a groundbreaking invention: the "Method of increasing deposition rate of silicon dioxide on a catalyst - Methods for forming dielectric layers." This invention introduces an innovative aluminum oxide/silicon oxide laminate film. The process involves sequentially exposing a substrate to an organoaluminum catalyst, followed by the use of remote plasmas of oxygen and nitrogen to convert the organoaluminum layer into a porous aluminum oxide layer. Finally, a silanol precursor is introduced to form a thick layer of silicon dioxide over the porous oxide layer. Notably, this process achieves an increased rate of silicon dioxide deposition, with each cycle yielding about 120 nanometers of silicon dioxide over the porous aluminum oxide layer.

Career Highlights

Chris W. Hill's career is closely associated with Micron Technology Incorporated, where he has made significant contributions to research and development in semiconductor materials and processes. His inventions not only demonstrate his expertise but also highlight his commitment to advancing technology in the field.

Collaborations

Throughout his career, Hill has collaborated with esteemed colleagues such as Garo Jacques Derderian and Gurtej S. Sandhu. These professional partnerships have fostered a culture of innovation and have contributed to the successful development of new technologies at Micron Technology.

Conclusion

Chris W. Hill stands out as an influential inventor in the semiconductor industry. His innovative methods for forming dielectric layers and enhancing deposition processes have paved the way for advancements in technology. With a strong foundation in research and collaboration, Hill continues to impact the field significantly through his contributions at Micron Technology.

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