Taoyuan, Taiwan

Chorng-Lih Young


Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Taoyuan County, TW (2016)
  • Taoyuan, TW (2018)

Company Filing History:


Years Active: 2016-2018

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3 patents (USPTO):Explore Patents

Title: Chorng-Lih Young: Innovator in Semiconductor Technology

Introduction

Chorng-Lih Young is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His innovative methods have advanced the fabrication processes of semiconductor devices, showcasing his expertise and dedication to the industry.

Latest Patents

Chorng-Lih Young's latest patents include a method of fabricating a semiconductor device and a method of fabricating a semiconductor device having contact structures. The first patent outlines a process that involves providing a semiconductor substrate with a fin structure, forming a recess in the fin structure, and creating a dopant source layer. This method ultimately leads to the formation of a side doped region in the fin structure. The second patent describes a method for fabricating a semiconductor device that includes forming gate structures on a fin, creating contact holes, and annealing a dopant source layer to diffuse dopants effectively.

Career Highlights

Chorng-Lih Young is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in developing advanced technologies that enhance the performance and efficiency of semiconductor devices.

Collaborations

Throughout his career, Chorng-Lih Young has collaborated with notable colleagues, including Kuan-Hung Chen and Rung-Yuan Lee. These collaborations have contributed to the successful development of innovative semiconductor technologies.

Conclusion

Chorng-Lih Young's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the advancement of semiconductor fabrication methods, making a lasting impact on the industry.

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