Seoul, South Korea

Choong Han Ryu

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Skhynix Inc.. Active years: 2013-2017.

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 1.2

ph-index = 2

Forward Citations = 9(Granted Patents)


Location History:

  • Seoul, KR (2013 - 2014)
  • Chungcheongbuk-do, KR (2017)

Company Filing History:


Years Active: 2013-2017

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3 patents (USPTO):Explore Patents

Title: Innovations by Choong Han Ryu

Introduction

Choong Han Ryu is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on methods of fabricating reflective photomasks, which are essential in the semiconductor manufacturing process.

Latest Patents

One of his latest patents is a method of fabricating a reflective photomask. This method involves sequentially forming a multi-layered reflective layer, an absorption layer, and an anti-reflective coating (ARC) layer on a substrate. The process includes forming ARC patterns to expose a portion of the absorption layer by directly irradiating an ion beam onto the ARC layer. The exposed portion of the absorption layer is then etched using the ARC patterns as etch masks to create absorption patterns that reveal a portion of the multi-layered reflective layer. Another significant patent involves reflection-type photomasks, which consist of a substrate and a reflection layer on the front surface. This design includes a pattern transfer region, a light-blocking region, and a border region, with a trench that penetrates the reflection layer to expose the substrate.

Career Highlights

Choong Han Ryu is currently employed at SK Hynix Inc., a leading semiconductor company. His work at SK Hynix has allowed him to advance his research and development in photomask technology, contributing to the company's innovative capabilities in the semiconductor industry.

Collaborations

He collaborates with fellow inventor Yong Dae Kim, enhancing the research and development efforts within their field.

Conclusion

Choong Han Ryu's contributions to photomask technology through his innovative patents demonstrate his expertise and commitment to advancing the semiconductor industry. His work continues to influence the development of more efficient manufacturing processes.

Profile summary based on public USPTO records.
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