Bucheon, South Korea

Chong-Kwang Chang

This inventor holds 9 USPTO granted patents and 7 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2012-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chong-Kwang Chang. Retrieved from https://idiyas.com/inventor/chong-kwang-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 66.7

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 20(Granted Patents)


Location History:

  • Incheon, KR (2013)
  • Buncheon-si, KR (2013)
  • Bucheon-si, KR (2012 - 2019)
  • Hwaseong-si, KR (2018 - 2019)

Company Filing History:


Years Active: 2012-2019

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9 patents (USPTO):Explore Patents

Title: Innovations of Chong-Kwang Chang

Introduction

Chong-Kwang Chang is a prominent inventor based in Bucheon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work has been instrumental in advancing integrated circuit devices and semiconductor devices.

Latest Patents

One of his latest patents is a semiconductor device that includes first and second fin patterns separated by a first trench. This device features a gate electrode that intersects the fin patterns and a contact on at least one side of the gate electrode. The contact interacts with the first fin pattern, while its bottom surface does not contact the second fin pattern. The patent details specific height measurements related to the fin patterns, emphasizing the innovative design of the semiconductor device.

Another notable patent is a method of manufacturing an integrated circuit device. This method involves forming a stacked mask structure that includes a carbon-containing film and a silicon-containing organic anti-reflective film on a substrate. The process includes etching to create a silicon-containing organic anti-reflective pattern and forming a composite mask pattern. Ions are then implanted into the substrate through spaces defined by the composite mask pattern, showcasing a sophisticated approach to integrated circuit manufacturing.

Career Highlights

Chong-Kwang Chang is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work at Samsung has allowed him to collaborate with leading experts in the field, further enhancing his contributions to innovation.

Collaborations

Some of his notable coworkers include Jung-Gun You and Hyung-Jong Lee. Their collaborative efforts have played a crucial role in the development of advanced semiconductor technologies.

Conclusion

Chong-Kwang Chang's innovative work in semiconductor devices and integrated circuit manufacturing has established him as a key figure in the field. His numerous patents reflect his commitment to advancing technology and improving electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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