Hsinchu, Taiwan

Chloe Hsu

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chloe Hsu. Retrieved from https://idiyas.com/inventor/chloe-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Chloe Hsu: Innovator in Semiconductor Fabrication

Introduction

Chloe Hsu is a prominent inventor based in Hsinchu, Taiwan. She has made significant contributions to the field of semiconductor technology. Her innovative approach has led to the development of a unique method for fabricating semiconductor devices.

Latest Patents

Chloe holds 1 patent for her invention titled "Method of Planarizing Film." This method involves forming a flowable-material (FM) layer over a substrate, which has distinct regions. The process includes creating trenches in the FM layer and performing an annealing process to reflow the material, ensuring that the trenches are filled effectively.

Career Highlights

Chloe is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. Her work focuses on enhancing the efficiency and effectiveness of semiconductor device fabrication.

Collaborations

Chloe has collaborated with talented coworkers, including Yu-Lun Liu and Shih-Chi Fu. Their combined expertise contributes to the advancement of semiconductor technologies.

Conclusion

Chloe Hsu's innovative methods and dedication to her field have positioned her as a key figure in semiconductor fabrication. Her contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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