This inventor holds 3 USPTO granted patents and 3 EPO patents. Top assignees: Toppan Printing Co., Ltd., Other. Active years: 2013-2014.
Location History:
- Omitama, JP (2013 - 2014)
- Tokyo, JP (2014)
Company Filing History:
2 out of 1,269 
1 out of 834,411 Years Active: 2013-2014
Title: Chisato Fujimura: Innovator in Gas-Barrier Technologies
Introduction
Chisato Fujimura is a prominent inventor based in Omitama, Japan. She has made significant contributions to the field of gas-barrier technologies, holding a total of 3 patents. Her work focuses on developing innovative materials that enhance the performance of gas-barrier structures.
Latest Patents
Fujimura's latest patents include advancements in coating liquids and gas-barrier multilayer structures. One of her notable inventions is a gas-barrier multilayer structure and the process for producing it. This technology ensures that gas-barrier multilayer structures and shaped articles are effectively protected from clouding, even when exposed to cold water at temperatures of 30°C or below. Additionally, she has developed a coating liquid that comprises a solvent mixture of water and an organic solvent, along with a polycarboxylic acid polymer that is partially neutralized with a polyvalent metal. This innovative coating liquid demonstrates excellent coating properties and is crucial for producing high-performance multilayer structures.
Another significant patent involves aqueous coating liquids that contain ultrafine inorganic compound particles. These coating liquids are designed to create gas barrier laminates that exhibit excellent transparency and gas barrier properties. The gas barrier laminate includes a substrate and a gas barrier layer formed from the coating liquid, which enhances its overall performance.
Career Highlights
Throughout her career, Chisato Fujimura has worked with Toppan Printing Co., Ltd., where she has contributed to various projects related to her field of expertise. Her innovative approach and dedication to research have positioned her as a key figure in the development of advanced gas-barrier technologies.
Collaborations
Fujimura has collaborated with notable colleagues, including Katsumi Kawaguchi and Masahiro Yamazaki. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Chisato Fujimura's contributions to gas-barrier technologies highlight her innovative spirit and commitment to excellence. Her patents reflect her expertise and dedication to advancing materials science, making her a significant figure in her field.