The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 2013
Filed:
May. 22, 2008
Yusaku Inaba, Omitama, JP;
Chisato Fujimura, Omitama, JP;
Yuka Noguchi, Ishioka, JP;
Katsumi Kawaguchi, Omitama, JP;
Yusaku Inaba, Omitama, JP;
Chisato Fujimura, Omitama, JP;
Yuka Noguchi, Ishioka, JP;
Katsumi Kawaguchi, Omitama, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
Gas barrier multilayer structure precursors are not clouded even when exposed to cold water and have excellent abuse resistance. Gas barrier multilayer structures are obtained from the gas barrier multilayer structure precursors. A gas barrier multilayer structure precursor includes a support and a gas barrier layer precursor formed on the support, the gas barrier layer precursor including a layer (A) and a layer (B), the layer (A) including a polycarboxylic acid polymer and a silicon-containing compound (i) derived from a silane coupling agent represented by Formula (1) below, the weight ratio of the polycarboxylic acid polymer and the silicon-containing compound (i) being in the range of 99.5:0.5 to 80.0:20.0, the layer (B) including a polyvalent metal compound, the layer (A) analyzed by a transmission method showing an infrared absorption spectrum in which the maximum peak height (α) in the range of 1490 to 1659 cmand the maximum peak height (β) in the range of 1660 to 1750 cmhave a ratio (α/β) of less than 1. A gas barrier multilayer structure is obtained by subjecting the gas barrier multilayer structure precursor to retort treatment, boil treatment or humidity conditioning treatment.Si(OR)Z  (1)