Hsinchu, Taiwan

Ching-Wei Shen


Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Taichung, TW (2013 - 2016)
  • Hsinchu, TW (2015 - 2021)

Company Filing History:


Years Active: 2013-2021

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10 patents (USPTO):Explore Patents

Title: Innovator Ching-Wei Shen: Pioneering High Durability Extreme Ultraviolet Photomasks

Introduction: Ching-Wei Shen is a prominent inventor based in Hsinchu, Taiwan, known for his significant contributions to the field of photomask technology. With an impressive portfolio of 10 patents to his name, Shen has established himself as a leading figure in innovation within the semiconductor industry.

Latest Patents: Among his notable inventions, one of the latest patents is the "High Durability Extreme Ultraviolet Photomask." This inventive work outlines a reflective mask that consists of a substrate, a reflective multilayer positioned on the substrate, and an anti-oxidation barrier layer that boasts an amorphous structure. This barrier layer features an average interatomic distance that is less than the diameter of an oxygen atom, enhancing its durability and effectiveness. In addition to this, an absorber layer is incorporated, patterned in accordance with an integrated circuit layout, which plays a crucial role in semiconductor manufacturing.

Career Highlights: Ching-Wei Shen works at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading global semiconductor foundry. His role at this renowned institution has allowed him to innovate and contribute to advancements in photomask technology, propelling the industry toward new heights.

Collaborations: Throughout his career, Shen has collaborated with esteemed colleagues such as Chi-Lun Lu and Kuan-Wen Lin. These partnerships have enriched his research and development endeavors, fostering an environment of shared innovation and expertise in the semiconductor field.

Conclusion: Ching-Wei Shen's dedication to creating high-durability photomasks marks him as a key player in semiconductor technology. His inventions not only push the boundaries of what's possible but also set new standards for quality and performance in the industry. As he continues to develop cutting-edge solutions, Shen's work remains vital for the future of photomask technology and the semiconductor landscape.

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