The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Aug. 21, 2015
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventors:
Kuan-Wen Lin, Taichung, TW;
Chi-Lun Lu, Hsinchu, TW;
Ching-Wei Shen, Hsinchu, TW;
Shu-Hsien Wu, Hsin-Chu County, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/82 (2012.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); B08B 3/10 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 1/82 (2013.01); B08B 3/02 (2013.01); B08B 3/08 (2013.01); B08B 3/10 (2013.01); G03F 7/2004 (2013.01);
Abstract
A method of cleaning a photomask is disclosed. The method includes mixing a first chemical solution with a second chemical solution; and discharging the mixed chemical solution through an outlet of a nozzle to a surface of the photomask on which includes a ruthenium (Ru) layer, wherein the first chemical solution is configured to dislodge contaminant particles from the surface of the photomask and the second chemical solution is configured to provide an electron to the first chemical solution.